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Browsing Research Publications/Outputs by Author "Abdelli-Messaci, S"
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Item Fast imaging of laser induced plasma emission of vanadium dioxide (VO2) target(2013-10) Masina, Bathusile N; Lafane, S; Wu, Lorinda; Kerdja, T; Abdelli-Messaci, S; Forbes, AThe main objective of this study is to fully optimise the synthesis of vanadium oxide nanostructures using pulsed laser deposition. We will attempt to realise this by studying the mechanism of the plasma formation and expansion during the pulsed laser deposition process of vanadium oxide, since the source of the films is a laser- generated plasma composed of neutrals and ionised atoms, molecules and other species. In this poster presentation, a spatio-temporal evolution study of different species such as VI (437.85 nm), VII (326.1 nm), VIII (237.1 nm) and VO (608.56 nm) are presented and compared.Item Optimisation study of the synthesis of vanadium oxide nanostructures using pulsed laser deposition(SPIE Proceedings, 2014-02) Masina, Bathusile N; Lafane, S; Wu, Lorinda; Abdelli-Messaci, S; Kerdja, T; Forbes, AFast imaging plasma plume study have been carried out on vanadium-oxygen plasma generated using 248 nm, 25 ns pulses from an excimer KrF laser under oxygen atmosphere. The plume expansion dynamics of an ablated VO(sub2) target was investigated using a fast-imaging technique. The free expansion, splitting, sharpening and stopping of the plume were observed during these oxygen pressures, 0.01, 0.05, 0.10 and 0.20 mbar. The influence of the plume dynamics study on the properties of the obtained vanadium oxide thin films were examined using X-Ray Diffraction method. A vanadium dioxide phases were deposited at 0.05 mbar oxygen pressure for target-substrate distance of 40 mm and 50 mm. Mixed phases of vanadium oxide were deposited at 0.01, 0.10 and 0.20 mbar oxygen pressure for target-substrate distance of 40 mm. Transition temperatures of around 60.9(supo)C have been measured from sample deposited at 0.05 mbar oxygen pressure for target-substrate distance of 50 mm. We observe mixed nanostructures for thin film prepared at 0.05 mbar for target-substrate distance of 40 mm, while the thin film prepared at 0.05 mbar for target-substrate of 50 mm shows an uniform nanostructure film.