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Extension of the lifetime of tantalum filaments in the hot-wire (Cat) 3 Chemical Vapor Deposition process

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dc.contributor.author Knoesen, D
dc.contributor.author Arendse, C
dc.contributor.author Halindintwali, S
dc.contributor.author Muller, T
dc.date.accessioned 2008-05-29T07:14:57Z
dc.date.available 2008-05-29T07:14:57Z
dc.date.issued 2008-01
dc.identifier.citation Knoesen, D, Arendse, CJ, Halindintwali, S and Muller, T. 2008. Extension of the lifetime of tantalum filaments in the hot-wire (Cat) 3 Chemical Vapor Deposition process. Thin Solid Films, Vol. 516(5), pp 822-825 en
dc.identifier.issn 0040-6090
dc.identifier.uri http://hdl.handle.net/10204/2257
dc.description Copyright: 2007 Elsevier Science B.V en
dc.description.abstract One of the prime components of a hot-wire (Cat) Chemical Vapor Deposition system is the filament used to pyro-catalytically crack the gases like silane. Burnt out tantalum filaments were studied to determine the possible improvement of lifetime for these filaments. The structure and chemical distribution in the filament were investigated, using electron microscopy and elemental analysis. It was found that at the high temperature centre section of a filament a thin surface silicide layer develops around a central metal core. At the filament ends a surface layer of metal silicide develops, that eventually consume the metal completely, causing breakages. Changes in the pre- and post-treatments of gas type and pressure were tested to improve the filament lifetime, arriving at a very simple procedure that increases the lifetime of the filament to several months. By annealing the hot filament both before and after a deposition run in a low pressure hydrogen ambient, a surface layer of pure silicon developed at the lower temperature ends, essentially protecting the metal from further silicidation. en
dc.language.iso en en
dc.publisher Elsevier Science B.V en
dc.subject Tantalum en
dc.subject Filaments en
dc.subject Chemical vapour deposition en
dc.subject Energy dispersive spectrography en
dc.subject Silicide en
dc.subject Lifetime en
dc.subject Electron microscopy en
dc.subject Hydrogen en
dc.title Extension of the lifetime of tantalum filaments in the hot-wire (Cat) 3 Chemical Vapor Deposition process en
dc.type Article en
dc.identifier.apacitation Knoesen, D., Arendse, C., Halindintwali, S., & Muller, T. (2008). Extension of the lifetime of tantalum filaments in the hot-wire (Cat) 3 Chemical Vapor Deposition process. http://hdl.handle.net/10204/2257 en_ZA
dc.identifier.chicagocitation Knoesen, D, C Arendse, S Halindintwali, and T Muller "Extension of the lifetime of tantalum filaments in the hot-wire (Cat) 3 Chemical Vapor Deposition process." (2008) http://hdl.handle.net/10204/2257 en_ZA
dc.identifier.vancouvercitation Knoesen D, Arendse C, Halindintwali S, Muller T. Extension of the lifetime of tantalum filaments in the hot-wire (Cat) 3 Chemical Vapor Deposition process. 2008; http://hdl.handle.net/10204/2257. en_ZA
dc.identifier.ris TY - Article AU - Knoesen, D AU - Arendse, C AU - Halindintwali, S AU - Muller, T AB - One of the prime components of a hot-wire (Cat) Chemical Vapor Deposition system is the filament used to pyro-catalytically crack the gases like silane. Burnt out tantalum filaments were studied to determine the possible improvement of lifetime for these filaments. The structure and chemical distribution in the filament were investigated, using electron microscopy and elemental analysis. It was found that at the high temperature centre section of a filament a thin surface silicide layer develops around a central metal core. At the filament ends a surface layer of metal silicide develops, that eventually consume the metal completely, causing breakages. Changes in the pre- and post-treatments of gas type and pressure were tested to improve the filament lifetime, arriving at a very simple procedure that increases the lifetime of the filament to several months. By annealing the hot filament both before and after a deposition run in a low pressure hydrogen ambient, a surface layer of pure silicon developed at the lower temperature ends, essentially protecting the metal from further silicidation. DA - 2008-01 DB - ResearchSpace DP - CSIR KW - Tantalum KW - Filaments KW - Chemical vapour deposition KW - Energy dispersive spectrography KW - Silicide KW - Lifetime KW - Electron microscopy KW - Hydrogen LK - https://researchspace.csir.co.za PY - 2008 SM - 0040-6090 T1 - Extension of the lifetime of tantalum filaments in the hot-wire (Cat) 3 Chemical Vapor Deposition process TI - Extension of the lifetime of tantalum filaments in the hot-wire (Cat) 3 Chemical Vapor Deposition process UR - http://hdl.handle.net/10204/2257 ER - en_ZA


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