Oliphant, CJArendse, CJPrins, SNMalgas, GFKnoesen, D2013-02-192013-02-192012-03Oliphant, CJ, Arendse, CJ, Prins, SN, Malgas, GF and Knoesen, D. 2012. Structural evolution of a Ta-filament during hot-wire chemical vapour deposition of Silicon investigated by electron backscatter diffraction. Journal of Materials Science, vol. 47(5), pp 0022-24610022-2461http://link.springer.com/article/10.1007%2Fs10853-011-6061-z?LI=truehttp://hdl.handle.net/10204/6560Copyright: 2012 Springer Verlag. This is the Pre/post print version of the work. The definitive version is published in Journal of Materials Science, vol. 47(5), pp 0022-2461In this study we investigate the structural changes of a burnt-out tantalum filament that was operated at typical hydrogenated nanocrystalline silicon synthesis conditions in our hot-wire chemical vapour deposition chamber. Scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffraction and for the first time electron backscatter diffraction showed that various silicides form preferentially along the length of the filament. At the cooler filament ends the TaSi2 phase forms, encapsulating a Ta inner core. The tantalum rich Ta5Si3, Si3Ta5 and Ta2Si phases however formed in addition to TaSi2 at the centre regions. Cracks and porosity were found throughout the length of the filament. The microstructure evolution of the aged tantalum filament is discussed based on a model comprising hydrogen damage and the reactions between the hot tantalum filament surface and silicon containing radicals. Possible effects of the well-known hydrogen treatment steps on filament degradation are also discussed.enHot-wire chemical vapour depositionFilamentTantalumElectron backscatter diffractionSilicidesElectron microscopyHydrogen damageEnergy dispersive spectroscopyX-ray diffractionArticleOliphant, C., Arendse, C., Prins, S., Malgas, G., & Knoesen, D. (2012). Structural evolution of a Ta-filament during hot-wire chemical vapour deposition of Silicon investigated by electron backscatter diffraction. http://hdl.handle.net/10204/6560Oliphant, CJ, CJ Arendse, SN Prins, GF Malgas, and D Knoesen "Structural evolution of a Ta-filament during hot-wire chemical vapour deposition of Silicon investigated by electron backscatter diffraction." (2012) http://hdl.handle.net/10204/6560Oliphant C, Arendse C, Prins S, Malgas G, Knoesen D. Structural evolution of a Ta-filament during hot-wire chemical vapour deposition of Silicon investigated by electron backscatter diffraction. 2012; http://hdl.handle.net/10204/6560.TY - Article AU - Oliphant, CJ AU - Arendse, CJ AU - Prins, SN AU - Malgas, GF AU - Knoesen, D AB - In this study we investigate the structural changes of a burnt-out tantalum filament that was operated at typical hydrogenated nanocrystalline silicon synthesis conditions in our hot-wire chemical vapour deposition chamber. Scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffraction and for the first time electron backscatter diffraction showed that various silicides form preferentially along the length of the filament. At the cooler filament ends the TaSi2 phase forms, encapsulating a Ta inner core. The tantalum rich Ta5Si3, Si3Ta5 and Ta2Si phases however formed in addition to TaSi2 at the centre regions. Cracks and porosity were found throughout the length of the filament. The microstructure evolution of the aged tantalum filament is discussed based on a model comprising hydrogen damage and the reactions between the hot tantalum filament surface and silicon containing radicals. Possible effects of the well-known hydrogen treatment steps on filament degradation are also discussed. DA - 2012-03 DB - ResearchSpace DP - CSIR KW - Hot-wire chemical vapour deposition KW - Filament KW - Tantalum KW - Electron backscatter diffraction KW - Silicides KW - Electron microscopy KW - Hydrogen damage KW - Energy dispersive spectroscopy KW - X-ray diffraction LK - https://researchspace.csir.co.za PY - 2012 SM - 0022-2461 T1 - Structural evolution of a Ta-filament during hot-wire chemical vapour deposition of Silicon investigated by electron backscatter diffraction TI - Structural evolution of a Ta-filament during hot-wire chemical vapour deposition of Silicon investigated by electron backscatter diffraction UR - http://hdl.handle.net/10204/6560 ER -