Modibedi, Remegia M2012-04-132012-04-132011-09Modibedi, M. Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view. CSIR-United States (US) Department of State and Joint Services, Science and Technology (S&T) workshop, CSIR, Pretoria, September 2011http://hdl.handle.net/10204/5753CSIR-United States (US) Department of State and Joint Services, Science and Technology (S&T) workshop, CSIR, Pretoria, September 2011Electrochemical atomic layer deposition technique is selected as one of the methods to prepare thin films for various applications, including electrocatalytic materials and compound.enCrystalline thin filmsElectrochemical atomic layersElectrocatalytic materialsElectrochemical atomic layer depositionECALDConference PresentationModibedi, R. M. (2011). Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view. http://hdl.handle.net/10204/5753Modibedi, Remegia M. "Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view." (2011): http://hdl.handle.net/10204/5753Modibedi RM, Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view; 2011. http://hdl.handle.net/10204/5753 .TY - Conference Presentation AU - Modibedi, Remegia M AB - Electrochemical atomic layer deposition technique is selected as one of the methods to prepare thin films for various applications, including electrocatalytic materials and compound. DA - 2011-09 DB - ResearchSpace DP - CSIR KW - Crystalline thin films KW - Electrochemical atomic layers KW - Electrocatalytic materials KW - Electrochemical atomic layer deposition KW - ECALD LK - https://researchspace.csir.co.za PY - 2011 T1 - Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view TI - Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view UR - http://hdl.handle.net/10204/5753 ER -