Arendse, CJMalgas, GFMuller, TFGKnoesen, DOliphant, CJMotaung, DEMwakikunga, Bonex W2009-11-122009-11-122009-04Arendse, CJ, Malgas, GF, Muller, TFG et al. 2009. Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD. Nanoscale Research Letters, Vol. 4(4), pp 307-3121931-7573http://www.ingentaconnect.com/content/klu/11671/2009/00000004/00000004http://hdl.handle.net/10204/3732Copyright: 2009 Springer-Verlag. This is the author's version of the work. It is posted here by permission of Springer-Verlag for your personal use. Not for redistribution. The definitive version was published in the Nanoscale Research Letters, Vol. 4(4), pp 307-312This paper reports on the thermally induced changes of the nano-structural and optical properties of hydrogenated nanocrystalline silicon in the temperature range 200–700 °C. The as-deposited sample has a high crystalline volume fraction of 53% with an average crystallite size of ~3.9 nm, where 66% of the total hydrogen is bonded as :Si–H monohydrides on the nano-crystallite surface. A growth in the native crystallite size and crystalline volume fraction occurs at annealing temperatures =400 °C, where hydrogen is initially removed from the crystallite grain boundaries followed by its removal from the amorphous network. The nucleation of smaller nano-crystallites at higher temperatures accounts for the enhanced porous structure and the increase in the optical band gap and average gap.enHydrogenated nanocrystalline siliconnc-Si:HHot wire CVDQuantum size effectsNano-crystalliteOptical band gapNano structuresArticleArendse, C., Malgas, G., Muller, T., Knoesen, D., Oliphant, C., Motaung, D., & Mwakikunga, B. W. (2009). Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD. http://hdl.handle.net/10204/3732Arendse, CJ, GF Malgas, TFG Muller, D Knoesen, CJ Oliphant, DE Motaung, and Bonex W Mwakikunga "Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD." (2009) http://hdl.handle.net/10204/3732Arendse C, Malgas G, Muller T, Knoesen D, Oliphant C, Motaung D, et al. Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD. 2009; http://hdl.handle.net/10204/3732.TY - Article AU - Arendse, CJ AU - Malgas, GF AU - Muller, TFG AU - Knoesen, D AU - Oliphant, CJ AU - Motaung, DE AU - Mwakikunga, Bonex W AB - This paper reports on the thermally induced changes of the nano-structural and optical properties of hydrogenated nanocrystalline silicon in the temperature range 200–700 °C. The as-deposited sample has a high crystalline volume fraction of 53% with an average crystallite size of ~3.9 nm, where 66% of the total hydrogen is bonded as :Si–H monohydrides on the nano-crystallite surface. A growth in the native crystallite size and crystalline volume fraction occurs at annealing temperatures =400 °C, where hydrogen is initially removed from the crystallite grain boundaries followed by its removal from the amorphous network. The nucleation of smaller nano-crystallites at higher temperatures accounts for the enhanced porous structure and the increase in the optical band gap and average gap. DA - 2009-04 DB - ResearchSpace DP - CSIR KW - Hydrogenated nanocrystalline silicon KW - nc-Si:H KW - Hot wire CVD KW - Quantum size effects KW - Nano-crystallite KW - Optical band gap KW - Nano structures LK - https://researchspace.csir.co.za PY - 2009 SM - 1931-7573 T1 - Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD TI - Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD UR - http://hdl.handle.net/10204/3732 ER -