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Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view

Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view

http://hdl.handle.net/10204/5753
 
Abstract:
Electrochemical atomic layer deposition technique is selected as one of the methods to prepare thin films for various applications, including electrocatalytic materials and compound.
Reference:
Modibedi, M. Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view. CSIR-United States (US) Department of State and Joint Services, Science and Technology (S&T) workshop, CSIR, Pretoria, September 2011
Modibedi, R. M. (2011). Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view. http://hdl.handle.net/10204/5753
Modibedi, Remegia M. "Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view." (2011): http://hdl.handle.net/10204/5753
Modibedi RM, Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view; 2011. http://hdl.handle.net/10204/5753 .
CSIR-United States (US) Department of State and Joint Services, Science and Technology (S&T) workshop, CSIR, Pretoria, September 2011
 
Modibedi, Remegia M
 
Sep 2011
 
Crystalline thin films
Electrochemical atomic layers
Electrocatalytic materials
Electrochemical atomic layer deposition
ECALD
 
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