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Please use this identifier to cite or link to this item: http://hdl.handle.net/10204/3732

Title: Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD
Authors: Arendse, CJ
Malgas, GF
Muller, TFG
Knoesen, D
Oliphant, CJ
Motaung, DE
Mwakikunga, BW
Keywords: Hydrogenated nanocrystalline silicon
nc-Si:H
Hot wire CVD
Quantum size effects
Nano-crystallite
Optical band gap
Nano structures
Issue Date: Apr-2009
Publisher: Springer - Verlag
Citation: Arendse, CJ, Malgas, GF, Muller, TFG et al. 2009. Thermally induced nano-structural and optical changes of nc-Si:H deposited by hot-wire CVD. Nanoscale Research Letters, Vol. 4(4), pp 307-312
Abstract: This paper reports on the thermally induced changes of the nano-structural and optical properties of hydrogenated nanocrystalline silicon in the temperature range 200–700 °C. The as-deposited sample has a high crystalline volume fraction of 53% with an average crystallite size of ~3.9 nm, where 66% of the total hydrogen is bonded as :Si–H monohydrides on the nano-crystallite surface. A growth in the native crystallite size and crystalline volume fraction occurs at annealing temperatures =400 °C, where hydrogen is initially removed from the crystallite grain boundaries followed by its removal from the amorphous network. The nucleation of smaller nano-crystallites at higher temperatures accounts for the enhanced porous structure and the increase in the optical band gap and average gap.
Description: Copyright: 2009 Springer-Verlag. This is the author's version of the work. It is posted here by permission of Springer-Verlag for your personal use. Not for redistribution. The definitive version was published in the Nanoscale Research Letters, Vol. 4(4), pp 307-312
URI: http://www.ingentaconnect.com/content/klu/11671/2009/00000004/00000004
http://hdl.handle.net/10204/3732
ISSN: 1931-7573
Appears in Collections:National Centre for nano-structured materials
Nanotechnology
Laser physics and technology
General science, engineering & technology

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