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Growth kinetics of nc-Si:H deposited at 200 °C by hot-wire chemical vapour deposition

Author: Oliphant, CJ ; Arendse, CJ ; Knoesen, D ; Muller, TFG ; Prins, S ; Malgas, GF Date: May 2011 The authors report on the growth kinetics of hydrogenated nanocrystalline silicon, with specific focus on the effects of the deposition time and hydrogen dilution on the nano-structural properties. The growth in the crystallite size, attributed ... Read more

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Browsing by Subject "Nanocrystalline silicon"

Browsing by Subject "Nanocrystalline silicon"

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