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Crystallization of HWCVD amorphous silicon thin films at elevated temperatures

Author: Muller, TFG ; Knoesen, D ; Arendse, C ; Swanepoel, R ; Halindintwali, S ; Theron, C Date: 2006 Hot-wire chemical vapour deposition (HWCVD) has been used to prepare both hydrogenated amorphous silicon (a-Si:H) and nano/ microcrystalline thin layers as intrinsic material at different deposition conditions, in order to establish optimum ... Read more

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Browsing by Subject "Microcrystalline thin layers"

Browsing by Subject "Microcrystalline thin layers"

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